Influence of strain on the dielectric behavior of (BaxSr1-x)Ti1+yO3+z thin films grown by LS-MOCVD on Pt/SiO2/Si

S. K. Streiffer, C. Basceri, C. B. Parker, S. E. Lash, J. Christman, H. Maiwa, Angus I. Kingon

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