InAs yP 1-y metamorphic buffer layers on InP substrates for mid-IR diode lasers

Jeremy Kirch, Toby Garrod, Sangho Kim, Joo H. Park, Jae C. Shin, L. J. Mawst, T. F. Kuech, X. Song, S. E. Babcock, Igor Vurgaftman, Jerry R. Meyer, Tung Sheng Kuan

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40 Scopus citations

Abstract

The defect-trapping effectiveness of an InAsP metamorphic buffer layer (MBL) design was investigated by studying the light-emission characteristics of InAs quantum wells grown on the MBL, along with structural characterization through SIMS and TEM measurements. Using a fixed recipe for the MBL, several separate confinement heterostructures (SCHs) were studied using 8-band k.p simulations, HRXRD, SEM, optical microscope and variable-temperature photoluminescence. Room temperature PL was observed at wavelengths near 3 μm, although the PL intensity drops significantly for samples with wavelengths longer than 2.85 μm. Laser operation was achieved at 77 K at a wavelength of 2.45 μm and threshold as low as 290 A/cm 2.

Original languageEnglish
Pages (from-to)1165-1169
Number of pages5
JournalJournal of Crystal Growth
Volume312
Issue number8
DOIs
StatePublished - Apr 1 2010
Externally publishedYes

Keywords

  • A3. Organometallic vapor phase epitaxy
  • A3. Quantum wells
  • B1. Antimonides
  • B1. Phosphides
  • B3. Laser diodes

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