In situ X-ray studies of metal organic chemical vapor deposition of PbZrxTi1 - xO3

R. V. Wang; F. Jiang; D. D. Fong; G. B. Stephenson; P. H. Fuoss; J. A. Eastman; S. K. Streiffer; K. Latifi; C. Thompson

doi:10.1016/j.tsf.2006.12.019

In situ X-ray studies of metal organic chemical vapor deposition of PbZr_xTi_{1 - x}O₃

R. V. Wang
, F. Jiang
, D. D. Fong
, G. B. Stephenson
, P. H. Fuoss
, J. A. Eastman
, S. K. Streiffer
, K. Latifi
, C. Thompson

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZr_xTi_{1 - x}O₃ (PZT) onto SrTiO₃ (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.

Original language	English
Pages (from-to)	5593-5596
Number of pages	4
Journal	Thin Solid Films
Volume	515
Issue number	14 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.tsf.2006.12.019
State	Published - May 23 2007
Externally published	Yes

Funding

This work was supported by the U. S. Dept. of Energy, Office of Science, Basic Energy Sciences, under contract DE-AC02-06CH11357.

Keywords

Alloy oxides
Depth profiling
Organometallic vapour deposition
Surface composition
X-ray scattering

Access to Document

10.1016/j.tsf.2006.12.019

Cite this

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title = "In situ X-ray studies of metal organic chemical vapor deposition of PbZrxTi1 - xO3 ",

abstract = "In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1 - xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.",

keywords = "Alloy oxides, Depth profiling, Organometallic vapour deposition, Surface composition, X-ray scattering",

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year = "2007",

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doi = "10.1016/j.tsf.2006.12.019",

language = "English",

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T1 - In situ X-ray studies of metal organic chemical vapor deposition of PbZrxTi1 - xO3

AU - Wang, R. V.

AU - Jiang, F.

AU - Fong, D. D.

AU - Stephenson, G. B.

AU - Fuoss, P. H.

AU - Eastman, J. A.

AU - Streiffer, S. K.

AU - Latifi, K.

AU - Thompson, C.

PY - 2007/5/23

Y1 - 2007/5/23

N2 - In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1 - xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.

AB - In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1 - xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.

KW - Alloy oxides

KW - Depth profiling

KW - Organometallic vapour deposition

KW - Surface composition

KW - X-ray scattering

UR - https://www.scopus.com/pages/publications/34247100685

U2 - 10.1016/j.tsf.2006.12.019

DO - 10.1016/j.tsf.2006.12.019

M3 - Article

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