In situ X-ray studies of metal organic chemical vapor deposition of PbZrxTi1 - xO3

R. V. Wang; F. Jiang; D. D. Fong; G. B. Stephenson; P. H. Fuoss; J. A. Eastman; S. K. Streiffer; K. Latifi; C. Thompson

doi:10.1016/j.tsf.2006.12.019

In situ X-ray studies of metal organic chemical vapor deposition of PbZr_xTi_{1 - x}O₃

R. V. Wang, F. Jiang, D. D. Fong, G. B. Stephenson, P. H. Fuoss, J. A. Eastman, S. K. Streiffer, K. Latifi, C. Thompson

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZr_xTi_{1 - x}O₃ (PZT) onto SrTiO₃ (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.

Original language	English
Pages (from-to)	5593-5596
Number of pages	4
Journal	Thin Solid Films
Volume	515
Issue number	14 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.tsf.2006.12.019
State	Published - May 23 2007
Externally published	Yes

Funding

This work was supported by the U. S. Dept. of Energy, Office of Science, Basic Energy Sciences, under contract DE-AC02-06CH11357.

Funders	Funder number
U. S. Dept. of Energy
Office of Science
Basic Energy Sciences	DE-AC02-06CH11357

Keywords

Alloy oxides
Depth profiling
Organometallic vapour deposition
Surface composition
X-ray scattering

Access to Document

10.1016/j.tsf.2006.12.019

Cite this

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title = "In situ X-ray studies of metal organic chemical vapor deposition of PbZrxTi1 - xO3 ",

abstract = "In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1 - xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.",

keywords = "Alloy oxides, Depth profiling, Organometallic vapour deposition, Surface composition, X-ray scattering",

author = "Wang, {R. V.} and F. Jiang and Fong, {D. D.} and Stephenson, {G. B.} and Fuoss, {P. H.} and Eastman, {J. A.} and Streiffer, {S. K.} and K. Latifi and C. Thompson",

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AU - Wang, R. V.

AU - Jiang, F.

AU - Fong, D. D.

AU - Stephenson, G. B.

AU - Fuoss, P. H.

AU - Eastman, J. A.

AU - Streiffer, S. K.

AU - Latifi, K.

AU - Thompson, C.

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AB - In situ synchrotron X-ray scattering and fluorescence techniques were used to simultaneously observe the evolution of the strain and composition of a growing crystal surface in real time. Control of the X-ray incidence angle allows us to obtain high surface sensitivity. We studied metal organic chemical vapor deposition (MOCVD) of epitaxial PbZrxTi1 - xO3 (PZT) onto SrTiO3 (001) substrates under various growth conditions. We observe a strong increase in Zr incorporation as strain relaxation occurs, consistent with the effect of compositional strain on the thermodynamic driving force for growth.

KW - Alloy oxides

KW - Depth profiling

KW - Organometallic vapour deposition

KW - Surface composition

KW - X-ray scattering

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