TY - JOUR
T1 - Impact of changes in the Pt heterostructure bottom electrodes on the ferroelectric properties of SBT thin films
AU - Kim, Seung Hyun
AU - Kim, D. J.
AU - Im, J.
AU - Streiffer, S. K.
AU - Auciello, O.
AU - Maria, J. P.
AU - Kingon, A. I.
PY - 1999
Y1 - 1999
N2 - The crystallinity and the microstructure of Sr0.8Bi2.3Ta2O9 (SBT) thin films improved with increasing annealing temperature, and strongly influenced the ferroelectric properties. In addition, the properties of SBT films, such as remanent polarization and leakage current density, are closely related to the film/electrode interface and surface roughness of the underlying electrode. SBT films on Pt/TiO2/SiO2/Si and Pt/ZrO2/SiO2/Si substrates exhibited high remanent polarization, low leakage current density, and low voltage saturation as compared to SBT films on Pt/Ti/SiO2Si substrates. This is deduced to be related to differences in film orientation, electrode roughness, and out-diffusion of Ti onto the surface of the bottom electrode.
AB - The crystallinity and the microstructure of Sr0.8Bi2.3Ta2O9 (SBT) thin films improved with increasing annealing temperature, and strongly influenced the ferroelectric properties. In addition, the properties of SBT films, such as remanent polarization and leakage current density, are closely related to the film/electrode interface and surface roughness of the underlying electrode. SBT films on Pt/TiO2/SiO2/Si and Pt/ZrO2/SiO2/Si substrates exhibited high remanent polarization, low leakage current density, and low voltage saturation as compared to SBT films on Pt/Ti/SiO2Si substrates. This is deduced to be related to differences in film orientation, electrode roughness, and out-diffusion of Ti onto the surface of the bottom electrode.
UR - http://www.scopus.com/inward/record.url?scp=0033351039&partnerID=8YFLogxK
U2 - 10.1080/10584589908215626
DO - 10.1080/10584589908215626
M3 - Conference article
AN - SCOPUS:0033351039
SN - 1058-4587
VL - 26
SP - 253
EP - 268
JO - Integrated Ferroelectrics
JF - Integrated Ferroelectrics
IS - 1
T2 - The 11th International Symposium on Integrated Ferroelectrics (ISIF99)
Y2 - 7 March 1999 through 10 March 1999
ER -