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Hiking down the Free Energy Landscape Using Sequential Solvent and Thermal Processing for Versatile Ordering of Block Copolymer Films

  • Kshitij Sharma
  • , Aman Agrawal
  • , Ali Masud
  • , Sushil K. Satija
  • , John F. Ankner
  • , Jack F. Douglas
  • , Alamgir Karim

    Research output: Contribution to journalArticlepeer-review

    5 Scopus citations

    Abstract

    The kinetics and morphology of the ordering of block copolymer (BCP) films are highly dependent on the processing pathway, as the enthalpic and entropic forces driving the ordering processes can be quite different depending on process history. We may gain some understanding and control of this variability of BCP morphology with processing history through a consideration of the free energy landscape of the BCP material and a consideration of how the processing procedure moves the system through this energy landscape in a way that avoids having the system becoming trapped into well-defined metastable minima having a higher free energy than the target low free energy ordered structure. It is well known that standard thermal annealing (TA) of BCPs leads to structures corresponding to a well-defined stable free energy minimum; however, the BCP must be annealed for a very long time before the target low free energy structures can be achieved. Herein, we show that the same target low-energy structure can be achieved relatively quickly by subjecting as-cast films to an initial solvent annealing [direct immersion annealing (DIA) or solvent vapor annealing (SVA)] procedure, followed by a short period of TA. This process relies on lowering the activation energy barrier by reducing the glass-transition temperature through DIA (or SVA), followed by a multi-interface chain rearrangement through sequential TA. This energy landscape approach to ordering should be applicable to the process design for ordering many other complex materials.

    Original languageEnglish
    Pages (from-to)21562-21574
    Number of pages13
    JournalACS Applied Materials and Interfaces
    Volume15
    Issue number17
    DOIs
    StatePublished - May 3 2023

    Funding

    We acknowledge NSF DMR 1905996 for support of the research.

    Keywords

    • block copolymer
    • direct immersion annealing
    • neutron reflectivity
    • self-assembly
    • solvent vapor annealing
    • thermal annealing
    • thin film

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