High-resolution PFPE-based molding techniques for nanofabrication of high-pattern density, Sub-20 nm features: A fundamental materials approach

Stuart S. Williams, Scott Retterer, Rene Lopez, Ricardo Ruiz, Edward T. Samulski, Joseph M. Desimone

Research output: Contribution to journalArticlepeer-review

94 Scopus citations

Abstract

Several perfluoropolyether (PFPE)-based elastomers for high-resolution replica molding applications are explored. The modulus of the elastomeric materials was increased through synthetic and additive approaches while maintaining relatively low surface tension values (<25 mN/m). Using large area (>4 in.2) master templates, we experimentally show the relationship between mold resolution and material properties such as modulus and surface tension for materials used in this study. A composite mold approach was used to form flexible molds out of stiff, high modulus materials that allow for replication of sub-20 nm post structures. Sub-100 nm line grating master templates, formed using e-beam lithography, were used to determine the experimental stability of the molding materials. It was observed that as the feature spacing decreased, high modulus PFPE tetramethacrylate (TMA) composite molds were able to effectively replicate the nanograting structures without cracking or tear-out defects that typically occur with high modulus elastomers.

Original languageEnglish
Pages (from-to)1421-1428
Number of pages8
JournalNano Letters
Volume10
Issue number4
DOIs
StatePublished - Apr 14 2010

Keywords

  • Molding
  • Nanofabrication
  • PRINT
  • Perfluoropolyether
  • Replica molding
  • Soft lithography

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