Abstract
Donor doped CdO thin films on c-plane sapphire are prepared by reactive co-sputtering from Cd-metal and Y-metal targets which are driven using pulsed-dc and RF power respectively. Intrinsic CdO exhibits a carrier density of 1.8 × 1019 cm-3 and a mobility of 330 cm2 V-1 s-1. By increasing the Y-flux, carrier density values can be increased smoothly and reproducibly to a maximum value of 3.3 × 1020 cm-3. Mobility increases with Y flux, and exhibits a broad plateau between approximately 5 × 1019 cm-3 and 2 × 1020 cm-3. Higher carrier concentrations produce a sharp drop in mobility. The increase in mobility is attributed to a reduction of intrinsic donors (i.e., oxygen vacancies) with increasing carrier density while the ultimate decrease in mobility results from a combination of factors including cadmium vacancies, reduced crystal quality, and smaller crystallite sizes, all of which accompany carrier density values greater than the mid 1020 cm-3 range. This work demonstrates that CdO thin films can be prepared by magnetron sputtering with transport properties and crystal quality that are comparable to those grown using molecular beam epitaxy.
| Original language | English |
|---|---|
| Article number | 076105 |
| Journal | APL Materials |
| Volume | 5 |
| Issue number | 7 |
| DOIs | |
| State | Published - Jul 1 2017 |
| Externally published | Yes |