Growths of staggered InGaN quantum wells light-emitting diodes emitting at 520-525 nm employing graded growth-temperature profile

Hongping Zhao, Guangyu Liu, Xiao Hang Li, G. S. Huang, Jonathan D. Poplawsky, S. Tafon Penn, Volkmar Dierolf, Nelson Tansu

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184 Scopus citations

Abstract

Three-layer staggered InGaN quantum wells (QWs) light-emitting diodes (LEDs) emitting at 520-525 nm were grown by metal-organic chemical vapor deposition by employing graded growth-temperature profile. The use of staggered InGaN QW, with improved electron-hole wave functions overlap design, leads to an enhancement of its radiative recombination rate. Both cathodoluminescence and electroluminescence measurements of three-layer staggered InGaN QW LED exhibited enhancements by 1.8-2.8 and 2.0-3.5 times, respectively, over those of conventional InGaN QW LED.

Original languageEnglish
Article number061104
JournalApplied Physics Letters
Volume95
Issue number6
DOIs
StatePublished - 2009
Externally publishedYes

Funding

The authors would like to acknowledge funding supports from U.S. Department of Energy (Grant No. DE-FC26-08NT01581) and U.S. National Science Foundation (Grant No. ECCS # 0701421).

FundersFunder number
National Science Foundation
U.S. Department of EnergyDE-FC26-08NT01581

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