Abstract
Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition was investigated. An inductively coupled plasma source that operated at a much lower neutral pressure of ∼50 mTorr was used. It was found that the ratio of etching species in the plasma to depositing species was critical to the final shape of the carbon structures that were formed.
Original language | English |
---|---|
Pages (from-to) | 1207-1209 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 83 |
Issue number | 6 |
DOIs | |
State | Published - Aug 11 2003 |