Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

J. B.O. Caughman, L. R. Baylor, M. A. Guillorn, V. I. Merkulov, D. H. Lowndes, L. F. Allard

Research output: Contribution to journalArticlepeer-review

53 Scopus citations

Abstract

Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition was investigated. An inductively coupled plasma source that operated at a much lower neutral pressure of ∼50 mTorr was used. It was found that the ratio of etching species in the plasma to depositing species was critical to the final shape of the carbon structures that were formed.

Original languageEnglish
Pages (from-to)1207-1209
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number6
DOIs
StatePublished - Aug 11 2003

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