Growth of high current density MgB2 films using ex-situ precursor approach

M. P. Paranthaman, D. K. Christen, H. M. Christen, J. R. Thompson, H. R. Kerchner, C. Cantoni, H. Y. Zhai

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Abstract

Superconducting MgB2 films with Tc = 39.0 K were prepared using an ex-situ precursor approach. Precursor films of boron, ∼0.6 μm thick, were deposited onto Al2O3(102) substrates by electron beam evaporation; subsequent post-anneal at 890 °C in the presence of MgB2 and Mg metal produced highly crystalline MgB2 films. Detailed X-ray diffraction studies indicate that the film is polycrystalline with some degree of c-axis texture. A transport Jc of over 4 × 106 A/cm2 was obtained on MgB2 films at 25 K and self-field. The higher irreversibility fields, Birr obtained from the transport measurements on MgB2 films indicate that there is some improvement in flux pinning at lower temperatures. The details of the film growth and transport property measurements are reported.

Original languageEnglish
Pages (from-to)1252-1255
Number of pages4
JournalPhysica C: Superconductivity and its Applications
Volume378-381
Issue numberPART 2
DOIs
StatePublished - Oct 2002

Funding

Thanks are due to Pam Fleming for evaporating the B films. This work was supported by the US Department of Energy, Division of Materials Sciences, Office of Science, and the Office of Power Technologies––Superconductivity Program, Office of Energy Efficiency and Renewable Energy. The research was performed at the Oak Ridge National Laboratory, managed by U.T.-Battelle, LLC for the USDOE under contract DE-AC05-00OR22725.

FundersFunder number
Division of Materials Sciences
Office of Power Technologies
U.S. Department of Energy
Office of Science
Office of Energy Efficiency and Renewable Energy

    Keywords

    • AlO substrates
    • E-beam evaporation
    • MgB films
    • Transport properties

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