Growth of a hard, novel CVD multilayer coating: Ti(C,N) on (Ti,Al)N on TiN

  • Mohamed Ben Hassine
  • , Hans Olof Andrén
  • , Anand H.S. Iyer
  • , Olof Bäcke
  • , Dirk Stiens
  • , Wiebke Janssen
  • , Johannes Kümmel
  • , Mats Halvarsson

Research output: Contribution to journalReview articlepeer-review

2 Scopus citations

Abstract

A novel chemical vapor deposition (CVD) multilayer coating intended for cutting applications was designed to achieve high wear and heat resistance during metal machining. The coating consists of three layers: a TiCN layer deposited on top of a TiAlN layer, which was grown on a layer of TiN that was deposited onto a cemented carbide substrate. The detailed microstructure of the coating was examined using a combination of electron microscope techniques. Two pyramidal surface morphologies and textures were observed, which could be related to the substrate roughness. Two growth modes were found: epitaxial growth of 〈211〉 oriented TiCN on <211> oriented TiAlN on <211> oriented TiN, leading to tilted TiCN pyramids at the coating surface; and epitaxial growth of 〈111〉 TiCN on <111> TiAlN on <111> TiN, leading to symmetrical TiCN pyramids at the coating surface.

Original languageEnglish
Article number106966
JournalInternational Journal of Refractory Metals and Hard Materials
Volume127
DOIs
StatePublished - Feb 2025
Externally publishedYes

Funding

This work is part of the CVD 2.0 project, supported by the Swedish Foundation for Strategic Research (SSF). This research was mainly carried out at the Chalmers Materials Analysis Laboratory (CMAL). The authors want to thank Dr. Antiope Lotsari from the Department of Chemistry, Chalmers University of Technology, for fruitful discussions about defects.

Keywords

  • CVD
  • HRSTEM
  • Interfacial dislocations
  • TiAlN
  • TiCN
  • WC-Co

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