Abstract
The growth mechanisms of MgB2 films obtained by different methods on various substrates are comparably studied by transport measurements and scanning electron microscopy observations. The analyzed films include those prepared by ex situ postanneal with Tc0 ∼ 38.8 K and those from in situ anneal with Tc0 ∼ 24 K. It is clearly observed that the films obtained by the high-temperature reaction of e-beam evaporated B with Mg vapor are formed by the nucleation of independent MgB2 grains at the film surface, indicating that this approach may not be suitable to obtain epitaxial films. A significant oxygen contamination was also present in films obtained from pulsed-laser-deposition-grown precursors, which drag the Tc0 down to 24 K.
Original language | English |
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Pages (from-to) | 2759-2762 |
Number of pages | 4 |
Journal | Journal of Materials Research |
Volume | 16 |
Issue number | 10 |
DOIs | |
State | Published - Oct 2001 |
Funding
The authors thank D.P. Norton and C. Rouleau for technical assistance and useful discussions. This research is sponsored by the U.S. Department of Energy under Contract DE-AC05-00OR22735 with the Oak Ridge National Laboratory, managed by UT-Battelle, LLC, and by the Department of Energy Office of Energy Efficiency and Renewable Energy, Office of Power Technologies—Superconductivity Program.