Growth behavior of carbon nanotubes on multilayered metal catalyst film in chemical vapor deposition

H. Cui, G. Eres, J. Y. Howe, A. Puretkzy, M. Varela, D. B. Geohegan, D. H. Lowndes

Research output: Contribution to journalArticlepeer-review

148 Scopus citations

Abstract

The temperature and time dependences of carbon nanotube (CNT) growth by chemical vapor deposition are studied using a multilayered Al/Fe/Mo catalyst on silicon substrates. Within the 600-1100 °C temperature range of these studies, narrower temperature ranges were determined for the growth of distinct types of aligned multi-walled CNTs and single-walled CNTs by using high-resolution transmission electron microscopy and Raman spectroscopy. At 900 °C, in contrast to earlier work, double-walled CNTs are found more abundant than single-walled CNTs. Defects also are found to accumulate faster than the ordered graphitic structure if the growth of CNTs is extended to long durations.

Original languageEnglish
Pages (from-to)222-228
Number of pages7
JournalChemical Physics Letters
Volume374
Issue number3-4
DOIs
StatePublished - Jun 11 2003

Funding

We thank P.H. Fleming for assistance with sample preparation. This research was supported by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory (ORNL), by the Office of Basic Energy Sciences, Division of Materials Sciences, US Department of Energy (DOE), and by the Defense Advanced Research Projects Agency under contract No. 1868HH26X1 with ORNL. The research was carried out at ORNL, managed by UT-Battelle, LLC, for the US DOE under contract No. DE-AC05-00OR22725. This research also was supported in part by an appointment (H. Cui) to the ORNL Postdoctoral Research Associates Program which is sponsored by ORNL and administered jointly by ORNL and by the Oak Ridge Institute for Science and Education under contract numbers DE-AC05-84OR21400 and DE-AC05-76OR00033, respectively.

Fingerprint

Dive into the research topics of 'Growth behavior of carbon nanotubes on multilayered metal catalyst film in chemical vapor deposition'. Together they form a unique fingerprint.

Cite this