Abstract
Pulsed-laser deposition (PLD) is a powerful method to grow thin films and multilayers of complex materials such as transition metal oxides. In this case, the most cited advantage of PLD is the simplicity of preserving the stoichiometry of the target material. Recently, there are many reports showing that PLD can significantly improve the growth of even simple metallic thin films/multilayers. Here it is the ultrahigh instantaneous deposition rate and the high kinetic energy of PLD that play the most crucial roles. The improved growth, in particular for the first several monolayers, provides great opportunities to design artificial thin film structures that have promising physical properties.
| Original language | English |
|---|---|
| Pages (from-to) | 163-218 |
| Number of pages | 56 |
| Journal | Surface Science Reports |
| Volume | 52 |
| Issue number | 5-6 |
| DOIs | |
| State | Published - Feb 2004 |
| Externally published | Yes |
Funding
We are grateful to many of our co-workers who have been working on metallic thin films and multilayers by PLD. In particular, we would like to thank the contributions from G.A. Farnan, J.X. Ma, A.P. Baddorf, J.F. Wendelken, E.W. Plummer, H. Jenniches, P. Ohresser, M. Zheng, J. Barthel, M. Klaua, S.S. Manoharan, C.V. Mohan, O. Fruchart, X.F. Jin, W. Kuch, and C Teichert. We acknowledge the sponsorship of the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT Battele, LLC, for the US Department of Energy under contract no. DE-AC05-00OR22725.
Keywords
- Laser methods
- Magnetic films
- Metal-metal magnetic heterostructures