Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition

Izabela Kruk; Brian L. Scott; Erik B. Watkins; Laura E. Wolfsberg

doi:10.1016/j.tsf.2021.138874

Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition

Izabela Kruk, Brian L. Scott, Erik B. Watkins, Laura E. Wolfsberg

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to α-U₃O₈ or α-UO₃. X-ray diffraction revealed preferential orientation along (100) in case of α-U₃O₈ or (001) for α-UO₃ for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be α-U₃O₈. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.

Original language	English
Article number	138874
Journal	Thin Solid Films
Volume	735
DOIs	https://doi.org/10.1016/j.tsf.2021.138874
State	Published - Oct 1 2021
Externally published	Yes

Funding

This work was supported by the US Department of Energy through the Los Alamos National Laboratory. Los Alamos National Laboratory is operated by Triad National Security, LLC, for the National Nuclear Security Administration of U.S. Department of Energy (Contract No. 89233218CNA000001 ). This work benefited from the use of the time-of-flight neutron reflectometer (Asterix) at the Lujan Neutron Scattering Center at LANSCE.

Keywords

Neutron reflectometry
Polymer assisted deposition
Thin film
Triuranium octoxide
Uranium oxide
X-ray Diffraction

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10.1016/j.tsf.2021.138874

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@article{bffff8a1bc824aba8b09e083d5167d89,

title = "Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition",

abstract = "A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to α-U3O8 or α-UO3. X-ray diffraction revealed preferential orientation along (100) in case of α-U3O8 or (001) for α-UO3 for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be α-U3O8. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.",

keywords = "Neutron reflectometry, Polymer assisted deposition, Thin film, Triuranium octoxide, Uranium oxide, X-ray Diffraction",

author = "Izabela Kruk and Scott, \{Brian L.\} and Watkins, \{Erik B.\} and Wolfsberg, \{Laura E.\}",

note = "Publisher Copyright: {\textcopyright} 2021",

year = "2021",

month = oct,

day = "1",

doi = "10.1016/j.tsf.2021.138874",

language = "English",

volume = "735",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition

AU - Kruk, Izabela

AU - Scott, Brian L.

AU - Watkins, Erik B.

AU - Wolfsberg, Laura E.

PY - 2021/10/1

Y1 - 2021/10/1

N2 - A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to α-U3O8 or α-UO3. X-ray diffraction revealed preferential orientation along (100) in case of α-U3O8 or (001) for α-UO3 for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be α-U3O8. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.

AB - A thin film of uranium oxide was deposited by polymer assisted deposition on a single crystal lanthanum aluminate - strontium aluminum tantalate substrate. The deposition resulted in formation of epitaxial thin film of uranium oxide, which could be attributed to α-U3O8 or α-UO3. X-ray diffraction revealed preferential orientation along (100) in case of α-U3O8 or (001) for α-UO3 for the thin film. A combination of x-ray and neutron reflectometry proved the sample to be α-U3O8. The film was of 17 nm thickness covered by a capping layer. The less dense capping layer could be a manifestation of surface water adsorbed on the sample.

KW - Neutron reflectometry

KW - Polymer assisted deposition

KW - Thin film

KW - Triuranium octoxide

KW - Uranium oxide

KW - X-ray Diffraction

UR - https://www.scopus.com/pages/publications/85113280454

U2 - 10.1016/j.tsf.2021.138874

DO - 10.1016/j.tsf.2021.138874

M3 - Article

AN - SCOPUS:85113280454

SN - 0040-6090

VL - 735

JO - Thin Solid Films

JF - Thin Solid Films

M1 - 138874

ER -

Growth and characterization of uranium oxide thin films deposited by polymer assisted deposition

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Keywords

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