Abstract
Phase separation in hafnium silicate films was investigated using grazing-incidence small-angle x-ray scattering (GISAXS) and high resolution transmission electron microscopy (HRTEM). The wavelengths of the composition fluctuations were found significant in comparison with current gate lengths. Films were rapidly thermal annealed (RTA) at temperatures between 700 and 1000°C in N2 gas after deposition.
| Original language | English |
|---|---|
| Pages (from-to) | 3141-3143 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 83 |
| Issue number | 15 |
| DOIs | |
| State | Published - Oct 13 2003 |
| Externally published | Yes |
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