Graphene nucleation on a surface-molten copper catalyst: Quantum chemical molecular dynamics simulations

Hai Bei Li, Alister J. Page, Christian Hettich, Bálint Aradi, Christof Köhler, Thomas Frauenheim, Stephan Irle, Keiji Morokuma

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

Chemical vapor deposition (CVD) growth of graphene on Cu(111) has been modeled with quantum chemical molecular dynamics (QM/MD) simulations. These simulations demonstrate at the atomic level how graphene forms on copper surfaces. In contrast to other popular catalysts, such as nickel and iron, copper is in a surface molten state throughout graphene growth at CVD-relevant temperatures, and graphene growth takes place without subsurface diffusion of carbon. Surface Cu atoms have remarkably high mobilities on the Cu(111) surface, both before and after graphene nucleation. This surface mobility drives "defect healing" processes in the nucleating graphene structure that convert defects such as pentagons and heptagons into carbon hexagons. Consequently, the graphene defects that become "kinetically trapped" using other catalysts, such as Ni and Fe, are less commonly observed in the case of Cu. We propose this mechanism to be the basis of copper's ability to form high-quality, large-domain graphene flakes.

Original languageEnglish
Pages (from-to)3493-3500
Number of pages8
JournalChemical Science
Volume5
Issue number9
DOIs
StatePublished - Sep 2014
Externally publishedYes

Funding

FundersFunder number
Japan Society for the Promotion of Science

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