Gold nanocomposites prepared by reactive sputtering

Reactive sputtering of gold and selected gold alloys in oxygen and nitrogen plasmas generated in a DC glow discharge was studied. Gold alloys examined were various compositions with gallium, aluminum and silicon. Gold is transported unreacted from a gold target to the substrate in a nitrogen plasma to form polycrystalline films, but gold alloys produce fine dispersions of gold in the corresponding ceramic nitride matrix which was crystalline for gallium and amorphous for silicon and aluminum. This contrasts with the behavior in an oxygen plasma which produces pure gold oxide, Au₂O₃, from a gold target and gold oxide-silicon oxide nanocomposites from Au/Si alloys. Gold oxide is thermally labile and reverts to the elements at 350 °C. Stress in gold oxide films was detected in the decomposition profile, volatile evolution versus temperature, as an event occurring at a lower temperature. The thermal lability of gold oxide was utilized to generate gold nanocomposites in silica with different metal loading through pyrolysis of the corresponding precursor gold oxide-silica films. The properties of gold oxide and gold nanocomposites are described.