Gas flow influence on negative hydrogen ion generation within the microwave-driven negative ion source

Shixiang Peng, Yuan Xu, Zhang Tao, Haitao Ren, Jingfeng Zhang, Jie Zhao, Zhiyu Guo, Jia'er Chen, Ailin Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

H-ion was generated through two processes within a volume Cs-free source. The density of molecule hydrogen gas will impact on the electron temperature within the primary discharge chamber that will influence the population of vibrational excited H2. Within the extraction region, the interaction between molecule hydrogen and H-ion will is cause the dissociation of negative ion. To better understand the gas flow influence on H-ion generation within a volume negative ion source, a new Cs-free volume microwave-driven H-source body with two gas inlets was developed at Peking University (PKU). Experiment on gas flow and gas pressure distribution within the plasma chamber was carried out with this source body. In the meantime a two dimensional (2D) model for gas flow was developed. Details will be presented in this paper.

Original languageEnglish
Title of host publication6th International Particle Accelerator Conference, IPAC 2015
PublisherJoint Accelerator Conferences Website (JACoW)
Pages2555-2558
Number of pages4
ISBN (Electronic)9783954501687
StatePublished - 2015
Externally publishedYes
Event6th International Particle Accelerator Conference, IPAC 2015 - Richmond, United States
Duration: May 3 2015May 8 2015

Publication series

Name6th International Particle Accelerator Conference, IPAC 2015

Conference

Conference6th International Particle Accelerator Conference, IPAC 2015
Country/TerritoryUnited States
CityRichmond
Period05/3/1505/8/15

Funding

Work supported by NSFC NO.11305004, 11175009 and 91126004.

FundersFunder number
National Natural Science Foundation of China11175009, 11305004, 91126004

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