Frank-van der Merwe growth in bilayer graphene

Haozhe Wang; Zhenpeng Yao; Gang Seob Jung; Qichen Song; Marek Hempel; Tomás Palacios; Gang Chen; Markus J. Buehler; Alán Aspuru-Guzik; Jing Kong

doi:10.1016/j.matt.2021.08.017

Frank-van der Merwe growth in bilayer graphene

Haozhe Wang, Zhenpeng Yao, Gang Seob Jung, Qichen Song, Marek Hempel, Tomás Palacios, Gang Chen, Markus J. Buehler, Alán Aspuru-Guzik, Jing Kong

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

Bilayer graphene has attracted significant interest because of its unique properties, including fascinating electrical behavior when one layer is slightly rotated relative to the other. However, the quality of large-area bilayer graphene is often limited by the layer-plus-island growth mode in which islands of thicker graphene present as unavoidable impurities. Here, we report the observation of the layer-by-layer, Frank-van der Merwe (FM) growth mode in bilayer graphene where multilayer impurities are suppressed. Instead of the conventional surface adhesive energy, we found it possible to tune interface adhesive energy with an oxidative pretreatment. The FM-grown bilayer graphene is of AB stacking or with small twisting angle (θ = 0°–5°), which is more mechanically robust compared with monolayer graphene, facilitating a free-standing wet transfer technology.

Original language	English
Pages (from-to)	3339-3353
Number of pages	15
Journal	Matter
Volume	4
Issue number	10
DOIs	https://doi.org/10.1016/j.matt.2021.08.017
State	Published - Oct 6 2021
Externally published	Yes

Funding

The work is partially performed at MIT Microsystems Technology Laboratories ( MTL ), MIT Materials Research Laboratories (MRL), and the Center for Nanoscale Systems (CNS), Harvard University . H.W. and J.K. acknowledge the support from the Center for Energy Efficient Electronics Science (NSF award no. 0939514). J.K. acknowledges support from the AFOSR FATE MURI , grant no. FA9550-15-1-0514 . Z.Y. and A.A.-G. acknowledge support from the Nanoporous Materials Genome Center by the U.S. Department of Energy , Office of Science , Office of Basic Energy Sciences under award no. DE-SC0008688. Q.S. and G.C. acknowledge support from Office of Naval Research under MURI grant N00014-16-1-2436 . G.S.J. and M.J.B. also acknowledge support from AFOSR FATE MURI, grant no. FA9550-15-1-0514 and the US Department of Defense, Office of Naval Research (N00014-16-1-233). The authors acknowledge Y. Zhang for help with the transmission electron microscope. The authors acknowledge W.S. Leong for the help with Raman measurements and manuscript editing.

Keywords

Frank-van der Merwe growth mode
MAP3: Understanding
Marangoni effect
Raman spectroscopy
bilayer graphene
chemical vapor deposition
graphene transfer technique
machine learning

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10.1016/j.matt.2021.08.017

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title = "Frank-van der Merwe growth in bilayer graphene",

abstract = "Bilayer graphene has attracted significant interest because of its unique properties, including fascinating electrical behavior when one layer is slightly rotated relative to the other. However, the quality of large-area bilayer graphene is often limited by the layer-plus-island growth mode in which islands of thicker graphene present as unavoidable impurities. Here, we report the observation of the layer-by-layer, Frank-van der Merwe (FM) growth mode in bilayer graphene where multilayer impurities are suppressed. Instead of the conventional surface adhesive energy, we found it possible to tune interface adhesive energy with an oxidative pretreatment. The FM-grown bilayer graphene is of AB stacking or with small twisting angle (θ = 0°–5°), which is more mechanically robust compared with monolayer graphene, facilitating a free-standing wet transfer technology.",

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AU - Palacios, Tomás

AU - Chen, Gang

AU - Buehler, Markus J.

AU - Aspuru-Guzik, Alán

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Frank-van der Merwe growth in bilayer graphene

Abstract

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Keywords

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