Formation of carbon-induced dimer vacancy defects on Si(0 0 1)-2 × 1 by thermal decomposition of organic molecules-lack of dependence on the molecules' structure

T. Suzuki, P. Maksymovych, J. Levy, J. T. Yates

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3 Scopus citations

Abstract

Two large and complex adsorbed organic molecules, coronene (C 24H12) and C60, have been used to produce Si dimer vacancy defects on Si(0 0 1) by thermal decomposition. Studies by STM show that the aligned structural arrangement of the dimer vacancy defects produced is independent of the chemical structure of the organic molecules. This indicates that the chemistry of the thermally decomposed carbon species produced by decomposition of the organic molecule controls the organization of the Si dimer vacancy defects. It is found that ∼1 C atom is responsible for each dimer vacancy defect for both molecules in accordance with earlier studies of C2H2 decomposition on Si(0 0 1).

Original languageEnglish
Pages (from-to)366-369
Number of pages4
JournalSurface Science
Volume600
Issue number2
DOIs
StatePublished - Jan 15 2006
Externally publishedYes

Funding

We acknowledge with thanks support for this work by DARPA QuIST through ARO contract number DAAD-19-01-1-0650, from the W.M. Keck Foundation and from NEDO (Japan).

Keywords

  • Auger electron spectroscopy
  • Compound formation
  • Nanopatterning
  • Scanning tunneling microscopy
  • Silicon
  • Silicon carbide
  • Surface chemical reaction

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