Abstract
Chemical vapor deposited diamond films grown in a hot filament reactor using three filament metals (tungsten, tantalum, and rhenium) have been analyzed for their metal impurity content. This is the first report wherein all three common CVD filament metals have been examined and a single technique used for diamond film analysis. Tungsten carbide filaments yielded the lowest impurity level (few ppm by mass), whereas rhenium yielded the highest (parts per thousand). The effects of filament temperature and addition of ammonia or oxygen to the reactant gas mixture were examined. A correlation was observed between the metal content of the product films and their quality, as judged using Raman spectroscopy. Films with the highest metal content yielded Raman spectra showing the lowest fluorescence background, the smallest sp2 carbon contribution, and the narrowest 1332 cm-1 diamond line.
| Original language | English |
|---|---|
| Pages (from-to) | 101-109 |
| Number of pages | 9 |
| Journal | Diamond and Related Materials |
| Volume | 8 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jan 1 1999 |
Funding
The authors thank Z.L. Tolt for growth of one of the diamond films described. Research sponsored by (1) the National Science Foundation (grant CTS-9202575) and (2) the Office of Basic Energy Sciences, US Department of Energy: Division of Chemical Sciences (contract DE-AC05-96OR22464), Division of Materials Sciences (DE-AC05-840R21400), and Office of Utility Technologies with Oak Ridge National Laboratory, managed by Lockheed Martin Energy Research Corporation.
| Funders | Funder number |
|---|---|
| Division of Chemical Sciences | DE-AC05-96OR22464 |
| Office of Basic Energy Sciences | |
| US Department of Energy | |
| National Science Foundation | CTS-9202575 |
| Lockheed Martin Corporation | |
| Oak Ridge National Laboratory | |
| Division of Materials Sciences and Engineering | DE-AC05-840R21400 |
Keywords
- Chemical vapor deposited diamond films
- Filament metal contamination
- Raman spectra