Field-emission studies of smooth and nanostructured carbon films

Vladimir I. Merkulov; Douglas H. Lowndes; Larry R. Baylor

doi:10.1063/1.124650

Field-emission studies of smooth and nanostructured carbon films

Vladimir I. Merkulov, Douglas H. Lowndes, Larry R. Baylor

Fusion Energy Division

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41 Scopus citations

Abstract

Electron field-emission tests were performed on carbon films prepared by hot-filament chemical-vapor deposition (HF-CVD) and pulsed-laser deposition (PLD). HF-CVD carbon films showed very good field-mission properties, with the emission starting immediately after the threshold voltage is achieved. Furthermore, HF-CVD films showed high-emission site density and durability, and no conditioning needed to initiate emission. PLD films did not appear to be a good-field emission materials.

Original language	English
Pages (from-to)	1228-1230
Number of pages	3
Journal	Applied Physics Letters
Volume	75
Issue number	9
DOIs	https://doi.org/10.1063/1.124650
State	Published - Aug 30 1999

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title = "Field-emission studies of smooth and nanostructured carbon films",

abstract = "Electron field-emission tests were performed on carbon films prepared by hot-filament chemical-vapor deposition (HF-CVD) and pulsed-laser deposition (PLD). HF-CVD carbon films showed very good field-mission properties, with the emission starting immediately after the threshold voltage is achieved. Furthermore, HF-CVD films showed high-emission site density and durability, and no conditioning needed to initiate emission. PLD films did not appear to be a good-field emission materials.",

author = "Merkulov, {Vladimir I.} and Lowndes, {Douglas H.} and Baylor, {Larry R.}",

year = "1999",

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AU - Merkulov, Vladimir I.

AU - Lowndes, Douglas H.

AU - Baylor, Larry R.

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Y1 - 1999/8/30

N2 - Electron field-emission tests were performed on carbon films prepared by hot-filament chemical-vapor deposition (HF-CVD) and pulsed-laser deposition (PLD). HF-CVD carbon films showed very good field-mission properties, with the emission starting immediately after the threshold voltage is achieved. Furthermore, HF-CVD films showed high-emission site density and durability, and no conditioning needed to initiate emission. PLD films did not appear to be a good-field emission materials.

AB - Electron field-emission tests were performed on carbon films prepared by hot-filament chemical-vapor deposition (HF-CVD) and pulsed-laser deposition (PLD). HF-CVD carbon films showed very good field-mission properties, with the emission starting immediately after the threshold voltage is achieved. Furthermore, HF-CVD films showed high-emission site density and durability, and no conditioning needed to initiate emission. PLD films did not appear to be a good-field emission materials.

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Field-emission studies of smooth and nanostructured carbon films

Abstract

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