Field emission from carbon films deposited by controlled-low-energy beams and CVD sources

Douglas H. Lowndes; Vladimir I. Merkulov; L. R. Baylor; G. E. Jellison; D. B. Poker; S. Kim; M. H. Sohn; N. W. Paik

Field emission from carbon films deposited by controlled-low-energy beams and CVD sources

Douglas H. Lowndes, Vladimir I. Merkulov, L. R. Baylor, G. E. Jellison, D. B. Poker, S. Kim, M. H. Sohn, N. W. Paik

Fusion Energy Division

Research output: Contribution to journal › Conference article › peer-review

Abstract

The role of doping and surface morphology in the field emission and energetic-beam control of carbon films was discussed. On a n-type Si substrate, carbon films with variable sp³ bonding fraction were deposited by ArF pulsed laser ablations (PLA). Direct metal ion-beam deposition (DMIBD) using primary Cesium beam was used to generate secondary propositions. DMIBD films were doped with Cesium whereas PLA films were found undoped. Highly-nanostructured materials were used to produce flat field emission cathodes.

Original language	English
Pages (from-to)	271-282
Number of pages	12
Journal	Materials Research Society Symposium - Proceedings
Volume	585
State	Published - 2000
Event	Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing - Boston, MA, USA Duration: Nov 29 2000 → Dec 2 2000

Cite this

@article{8c31571c893c4de78b145c47369832f4,

title = "Field emission from carbon films deposited by controlled-low-energy beams and CVD sources",

abstract = "The role of doping and surface morphology in the field emission and energetic-beam control of carbon films was discussed. On a n-type Si substrate, carbon films with variable sp3 bonding fraction were deposited by ArF pulsed laser ablations (PLA). Direct metal ion-beam deposition (DMIBD) using primary Cesium beam was used to generate secondary propositions. DMIBD films were doped with Cesium whereas PLA films were found undoped. Highly-nanostructured materials were used to produce flat field emission cathodes.",

author = "Lowndes, {Douglas H.} and Merkulov, {Vladimir I.} and Baylor, {L. R.} and Jellison, {G. E.} and Poker, {D. B.} and S. Kim and Sohn, {M. H.} and Paik, {N. W.}",

year = "2000",

language = "English",

volume = "585",

pages = "271--282",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

note = "Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing ; Conference date: 29-11-2000 Through 02-12-2000",

}

TY - JOUR

T1 - Field emission from carbon films deposited by controlled-low-energy beams and CVD sources

AU - Lowndes, Douglas H.

AU - Merkulov, Vladimir I.

AU - Baylor, L. R.

AU - Jellison, G. E.

AU - Poker, D. B.

AU - Kim, S.

AU - Sohn, M. H.

AU - Paik, N. W.

PY - 2000

Y1 - 2000

N2 - The role of doping and surface morphology in the field emission and energetic-beam control of carbon films was discussed. On a n-type Si substrate, carbon films with variable sp3 bonding fraction were deposited by ArF pulsed laser ablations (PLA). Direct metal ion-beam deposition (DMIBD) using primary Cesium beam was used to generate secondary propositions. DMIBD films were doped with Cesium whereas PLA films were found undoped. Highly-nanostructured materials were used to produce flat field emission cathodes.

AB - The role of doping and surface morphology in the field emission and energetic-beam control of carbon films was discussed. On a n-type Si substrate, carbon films with variable sp3 bonding fraction were deposited by ArF pulsed laser ablations (PLA). Direct metal ion-beam deposition (DMIBD) using primary Cesium beam was used to generate secondary propositions. DMIBD films were doped with Cesium whereas PLA films were found undoped. Highly-nanostructured materials were used to produce flat field emission cathodes.

UR - http://www.scopus.com/inward/record.url?scp=0034510984&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0034510984

SN - 0272-9172

VL - 585

SP - 271

EP - 282

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Fundamental Mechanisms of Low-Energy-Beam-Modified Surface Growth and Processing

Y2 - 29 November 2000 through 2 December 2000

ER -

Field emission from carbon films deposited by controlled-low-energy beams and CVD sources

Abstract

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