Abstract
The results of field emission measurements of various forms of carbon films are reported. It is shown that the films' nanostructure is a crucial factor determining the field emission properties. In particular, smooth, pulsed-laser deposited amorphous carbon films with both high and low sp3 contents are poor field emitters. This is similar to the results obtained for smooth nanocrystalline, sp2- bonded carbon films. In contrast, carbon films prepared by hot-filament chemical vapor deposition (HF-CVD) exhibit very good field emission properties, including low emission turn-on fields, high emission site density, and excellent durability. HF-CVD carbon films were found to be predominantly sp2-bonded. However, surface morphology studies show that these films are thoroughly nanostructured, which is believed to be responsible for their promising field emission properties.
Original language | English |
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Pages (from-to) | 221-226 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 593 |
State | Published - 2000 |
Event | Symposium-Amorphous and Nanoestructured Carbon - Boston, MA, USA Duration: Nov 29 1999 → Dec 2 1999 |