Ferroelectric thin films: Review of materials, properties, and applications

N. Setter; D. Damjanovic; L. Eng; G. Fox; S. Gevorgian; S. Hong; A. Kingon; H. Kohlstedt; N. Y. Park; G. B. Stephenson; I. Stolitchnov; A. K. Taganstev; D. V. Taylor; T. Yamada; S. Streiffer

doi:10.1063/1.2336999

Ferroelectric thin films: Review of materials, properties, and applications

N. Setter, D. Damjanovic, L. Eng, G. Fox, S. Gevorgian, S. Hong, A. Kingon, H. Kohlstedt, N. Y. Park, G. B. Stephenson, I. Stolitchnov, A. K. Taganstev, D. V. Taylor, T. Yamada, S. Streiffer

Research output: Contribution to journal › Review article › peer-review

1703 Scopus citations

Abstract

An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems' applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems' applications, and permittivity and loss in ferroelectric films - important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.

Original language	English
Article number	051606
Journal	Journal of Applied Physics
Volume	100
Issue number	5
DOIs	https://doi.org/10.1063/1.2336999
State	Published - 2006
Externally published	Yes

Funding

This review is part of the activity of MIND—European Network on Piezoelectrics (6th FP). The European Commission is acknowledged for the financial support [to one of the authors (N.S.)]. Acknowledgments are given also to the Swiss National Science Foundation [to four of the authors (I.S., T.Y., A.K.T., and N.S.)], to the Volkswagen-Stiftung Project “Nano-sized Ferroelectric Hybrids” under Contract No. I/77737 and that of the Deutsche Forschungsgemeinschaft (DFG) [to one of the authors (H.K.)], and to the Deutsche Forschungsgemeinschaft DFG under Project No. FOR 520 [to another author (L.E.)]. Matthew Davis and Guido Gerra are acknowledged for correcting the manuscript.

Funders	Funder number
European Commission
Deutsche Forschungsgemeinschaft
Volkswagen Foundation	I/77737
Volkswagen Foundation
Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

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Setter, N., Damjanovic, D., Eng, L., Fox, G., Gevorgian, S., Hong, S., Kingon, A., Kohlstedt, H., Park, N. Y., Stephenson, G. B., Stolitchnov, I., Taganstev, A. K., Taylor, D. V., Yamada, T., & Streiffer, S. (2006). Ferroelectric thin films: Review of materials, properties, and applications. Journal of Applied Physics, 100(5), Article 051606. https://doi.org/10.1063/1.2336999

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abstract = "An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems' applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems' applications, and permittivity and loss in ferroelectric films - important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.",

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AU - Setter, N.

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AU - Fox, G.

AU - Gevorgian, S.

AU - Hong, S.

AU - Kingon, A.

AU - Kohlstedt, H.

AU - Park, N. Y.

AU - Stephenson, G. B.

AU - Stolitchnov, I.

AU - Taganstev, A. K.

AU - Taylor, D. V.

AU - Yamada, T.

AU - Streiffer, S.

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AB - An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems' applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems' applications, and permittivity and loss in ferroelectric films - important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.

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Ferroelectric thin films: Review of materials, properties, and applications

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