Ferroelectric phenomena in Si-doped HfO₂ thin films with TiN and Ir electrodes

Patrick D. Lomenzo, Peng Zhao, Qanit Takmeel, Saeed Moghaddam, Toshikazu Nishida, Matthew Nelson, Chris M. Fancher, Everett D. Grimley, Xiahan Sang, James M. Lebeau, Jacob L. Jones

Research output: Contribution to journal › Article › peer-review

128 Scopus citations