Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition

D. Welipitiya; Y. L. He; Jiandi Zhang; P. I. Oden; T. Thundat; R. J. Warmack; Ismail Gobulukoglu; Z. S. Shan; D. J. Sellmyer; P. A. Dowben

doi:10.1063/1.362999

Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition

D. Welipitiya, Y. L. He, Jiandi Zhang, P. I. Oden, T. Thundat, R. J. Warmack, Ismail Gobulukoglu, Z. S. Shan, D. J. Sellmyer, P. A. Dowben

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features were deposited on a Si(111) wafer by this method. Their magnetic properties were studied by alternating gradient force magnetometry as well as magnetic force microscopy. Our morphological and magnetic measurements show that the structures are spatially well defined, and the magnetic properties are related to the structural shapes of the features. This method can be adapted to the fabrication of smaller-scale magnetic and electronic devices.

Original language	English
Pages (from-to)	1867-1871
Number of pages	5
Journal	Journal of Applied Physics
Volume	80
Issue number	3
DOIs	https://doi.org/10.1063/1.362999
State	Published - Aug 1 1996
Externally published	Yes

Access to Document

10.1063/1.362999

Cite this

@article{ca3f652d02e9475f86afb93aae3e0a8c,

title = "Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition",

abstract = "We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features were deposited on a Si(111) wafer by this method. Their magnetic properties were studied by alternating gradient force magnetometry as well as magnetic force microscopy. Our morphological and magnetic measurements show that the structures are spatially well defined, and the magnetic properties are related to the structural shapes of the features. This method can be adapted to the fabrication of smaller-scale magnetic and electronic devices.",

author = "D. Welipitiya and He, {Y. L.} and Jiandi Zhang and Oden, {P. I.} and T. Thundat and Warmack, {R. J.} and Ismail Gobulukoglu and Shan, {Z. S.} and Sellmyer, {D. J.} and Dowben, {P. A.}",

year = "1996",

month = aug,

day = "1",

doi = "10.1063/1.362999",

language = "English",

volume = "80",

pages = "1867--1871",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "3",

}

TY - JOUR

T1 - Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition

AU - Welipitiya, D.

AU - He, Y. L.

AU - Zhang, Jiandi

AU - Oden, P. I.

AU - Thundat, T.

AU - Warmack, R. J.

AU - Gobulukoglu, Ismail

AU - Shan, Z. S.

AU - Sellmyer, D. J.

AU - Dowben, P. A.

PY - 1996/8/1

Y1 - 1996/8/1

N2 - We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features were deposited on a Si(111) wafer by this method. Their magnetic properties were studied by alternating gradient force magnetometry as well as magnetic force microscopy. Our morphological and magnetic measurements show that the structures are spatially well defined, and the magnetic properties are related to the structural shapes of the features. This method can be adapted to the fabrication of smaller-scale magnetic and electronic devices.

AB - We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features were deposited on a Si(111) wafer by this method. Their magnetic properties were studied by alternating gradient force magnetometry as well as magnetic force microscopy. Our morphological and magnetic measurements show that the structures are spatially well defined, and the magnetic properties are related to the structural shapes of the features. This method can be adapted to the fabrication of smaller-scale magnetic and electronic devices.

UR - http://www.scopus.com/inward/record.url?scp=0343515280&partnerID=8YFLogxK

U2 - 10.1063/1.362999

DO - 10.1063/1.362999

M3 - Article

AN - SCOPUS:0343515280

SN - 0021-8979

VL - 80

SP - 1867

EP - 1871

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 3

ER -

Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition

Abstract

Access to Document

Other files and links

Fingerprint

Cite this