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Fabrication and characterization of self-aligned InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors

  • Chien Fong Lo
  • , Chih Yang Chang
  • , S. H. Chen
  • , C. M. Chang
  • , S. Y. Wang
  • , J. I. Chyi
  • , I. I. Kravchenko
  • , S. J. Pearton
  • , F. Ren

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

    Abstract

    A trilevel resist system was employed to fabricate self-aligned, submicron emitter finger In0.52Al0.48As/In0.42Ga 0.58As0.77Sb0.23/In0.53Ga 0.47As double heterojunction bipolar transistors (DHBTs). Selective wet-etchants were used to define the emitter fingers and to form an InGaAs guard-ring around the emitter fingers. Due to the low energy bandgap of the InGaAsSb base layer and type II base-collector junction, a low turn-on voltage of 0.38 V at 1 A/cm2and a high dc current gain of 123.8 for a DHBT with a 0.65 x 8.65 μm2 emitter area were obtained. A unity gain cut-off frequency (fT) of 260 GHz and a maximum oscillation frequency (fmax) of 485 GHz at JC = 302 kA/cm2 were achieved.

    Original languageEnglish
    Title of host publicationState-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53
    PublisherElectrochemical Society Inc.
    Pages117-127
    Number of pages11
    Edition6
    ISBN (Electronic)9781607682608
    ISBN (Print)9781566779067
    DOIs
    StatePublished - 2011
    EventState-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53 - 220th ECS Meeting - Boston, MA, United States
    Duration: Oct 9 2011Oct 14 2011

    Publication series

    NameECS Transactions
    Number6
    Volume41
    ISSN (Print)1938-5862
    ISSN (Electronic)1938-6737

    Conference

    ConferenceState-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53 - 220th ECS Meeting
    Country/TerritoryUnited States
    CityBoston, MA
    Period10/9/1110/14/11

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