Exposing high-energy surfaces by rapid-anneal solid phase epitaxy

Y. Wang, Y. Song, R. Peng, A. Herklotz, M. F. Chisholm, Z. L. Wu, T. Z. Ward, H. H. Weitering, P. C. Snijders

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The functional design of transition metal oxide heterostructures depends critically on the growth of atomically flat epitaxial thin films. Often, improved functionality is expected for heterostructures and surfaces with orientations that do not have the lowest surface free energy. For example, crystal faces with a high surface free energy, such as rutile (001) planes, frequently exhibit higher catalytic activities but are correspondingly harder to synthesize due to faceting transitions. Here we propose a broadly applicable rapid-anneal solid phase epitaxial synthesis approach for the creation of nanometer thin, high surface free energy oxide heterostructures that are atomically flat. We demonstrate its efficacy by synthesizing atomically flat epitaxial RuO2(001) and TiO2(001) model systems. The former have a superior oxygen evolution activity, quantified by their lower onset potential and higher current density, relative to that of more common RuO2(110) films.

Original languageEnglish
Article number086103
JournalAPL Materials
Volume5
Issue number8
DOIs
StatePublished - Aug 1 2017

Fingerprint

Dive into the research topics of 'Exposing high-energy surfaces by rapid-anneal solid phase epitaxy'. Together they form a unique fingerprint.

Cite this