Excitation of Eu3+ in gallium nitride epitaxial layers: Majority versus trap defect center

N. Woodward, J. Poplawsky, B. Mitchell, A. Nishikawa, Y. Fujiwara, V. Dierolf

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Abstract

We report studies of the excitation mechanism of Eu ions in situ doped during organometallic vapor-phase epitaxy (OMVPE) of GaN. We find that the bright red emission under above-band gap excitation originates primarily from an incorporation site that exhibits high excitation efficiency but occurs in low relative abundance (<3%). The latter represents a device efficiency bottleneck, limiting the emission at high excitation intensities. The majority site, which scales well with the total Eu concentration, exhibits low energy transfer efficiency but dominates the emission under direct excitation in the visible spectral region due to high relative abundance (>97%).

Original languageEnglish
Article number011102
JournalApplied Physics Letters
Volume98
Issue number1
DOIs
StatePublished - Jan 3 2011
Externally publishedYes

Funding

The work was supported by a grant from the National Science Foundation (Grant No. NSF-DMR 0705217). Y.F. and A.N. would like to acknowledge gratefully financial support by Grant-in-Aid for Creative Scientific Research Grant No. 19GS1209 from the Japan Society for the Promotion of Science, and by Grant-in-Aid for Young Scientists (B) Grant No. 21760007 and by the Global Centre of Excellence Program ‘Advanced Structural and Functional Materials Design’ from the Ministry of Education, Culture, Sports, Science and Technology of Japan.

FundersFunder number
National Science FoundationNSF-DMR 0705217
Japan Society for the Promotion of Science19GS1209, 21760007
Ministry of Education, Culture, Sports, Science and Technology

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