Erratum: Creation of a two-dimensional electron gas at an oxide interface on silicon (Nature Communications (2010) 1 (94) DOI: 10.1038/ncomms1096)

J. W. Park, D. F. Bogorin, C. Cen, D. A. Felker, Y. Zhang, C. T. Nelson, C. W. Bark, C. M. Folkman, X. Q. Pan, M. S. Rzchowski, J. Levy, C. B. Eom

Research output: Contribution to journalComment/debate

Original languageEnglish
Article number1457
JournalNature Communications
Volume4
DOIs
StatePublished - 2013

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