Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 thin films grown by MOCVD

P. K. Baumann, S. K. Streiffer, G. R. Bai, K. Ghosh, O. Auciello, C. Thompson, S. Stemmer, R. A. Rao, C. B. Eom, F. Xu, S. Trolier-Mckinstry, D. J. Kim, J. P. Maria, A. I. Kingon

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations

Abstract

Epitaxial Pb(Mg1/3Nb2/3)O3 (PMN) and (1-x)(Pb(Mg1/3Nb2/3)O3)-x (PbTiO3) (PMN-PT) thin films have been deposited by metalorganic chemical vapor deposition at 700 - 780°C on (100) SrTiO3 and SrRuO3/SrTiO3 substrates. Room temperature values of 900 and 1.5%, were measured for the zero-bias permittivity and loss respectively, at 10 kHz for 220 nm thick pure PMN films. For PMN-PT films, the small-signal permittivity ranged from 1000 to 1500 depending on deposition conditions and Ti content; correspondingly low values for the zero-bias dielectric loss between 1 and 5% were determined for all samples. For PMN-PT with x of approximately 0.30-0.35, polarization hysteresis with Pr≈18 μC/cm2 was obtained. Initial piezoresponse results are discussed.

Original languageEnglish
Pages (from-to)1881/151-1888/158
JournalIntegrated Ferroelectrics
Volume35
Issue number1-4
DOIs
StatePublished - 2001
Externally publishedYes
Event12th Interntional Symposium on Integrated Ferroelectrics - Aachen, Germany
Duration: Mar 12 2000Mar 15 2000

Keywords

  • Impurity phases
  • MOCVD
  • Piezoelectric properties
  • PMN-PT

Fingerprint

Dive into the research topics of 'Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 thin films grown by MOCVD'. Together they form a unique fingerprint.

Cite this