Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane: Possible Implications for Plasma Processing Discharges

L. A. Pinnaduwage; M. Z. Martin; L. G. Christophorou

doi:10.1002/ctpp.2150350411

Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane: Possible Implications for Plasma Processing Discharges

L. A. Pinnaduwage
, M. Z. Martin
, L. G. Christophorou

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH₄ (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H⁻ ions are produced via this process. The possible significance of this process for plasma processing discharges using CH₄ and its mixtures is indicated.

Original language	English
Pages (from-to)	433-438
Number of pages	6
Journal	Contributions to Plasma Physics
Volume	35
Issue number	4-5
DOIs	https://doi.org/10.1002/ctpp.2150350411
State	Published - 1995

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title = "Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane: Possible Implications for Plasma Processing Discharges",

abstract = "Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H− ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4 and its mixtures is indicated.",

author = "Pinnaduwage, \{L. A.\} and Martin, \{M. Z.\} and Christophorou, \{L. G.\}",

year = "1995",

doi = "10.1002/ctpp.2150350411",

language = "English",

volume = "35",

pages = "433--438",

journal = "Contributions to Plasma Physics",

issn = "0863-1042",

publisher = "Wiley-VCH Verlag",

number = "4-5",

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TY - JOUR

T1 - Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane

T2 - Possible Implications for Plasma Processing Discharges

AU - Pinnaduwage, L. A.

AU - Martin, M. Z.

AU - Christophorou, L. G.

PY - 1995

Y1 - 1995

N2 - Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H− ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4 and its mixtures is indicated.

AB - Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H− ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4 and its mixtures is indicated.

UR - https://www.scopus.com/pages/publications/84984342528

U2 - 10.1002/ctpp.2150350411

DO - 10.1002/ctpp.2150350411

M3 - Article

AN - SCOPUS:84984342528

SN - 0863-1042

VL - 35

SP - 433

EP - 438

JO - Contributions to Plasma Physics

JF - Contributions to Plasma Physics

IS - 4-5

ER -

Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane: Possible Implications for Plasma Processing Discharges

Abstract

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