TY - JOUR
T1 - Enhanced Negative Ion Formation in ArF‐Laser‐Irradiated Methane
T2 - Possible Implications for Plasma Processing Discharges
AU - Pinnaduwage, L. A.
AU - Martin, M. Z.
AU - Christophorou, L. G.
PY - 1995
Y1 - 1995
N2 - Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H− ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4 and its mixtures is indicated.
AB - Oberservation of enhanced electron attachment to ArF‐excimer‐laser irradiated methane is reported. Preliminary evidence is presented that laser‐excited superexcited states of CH4 (or other excited states to which these convert) are responsible for the observed enhanced electron attachment, and, that predominantly H− ions are produced via this process. The possible significance of this process for plasma processing discharges using CH4 and its mixtures is indicated.
UR - http://www.scopus.com/inward/record.url?scp=84984342528&partnerID=8YFLogxK
U2 - 10.1002/ctpp.2150350411
DO - 10.1002/ctpp.2150350411
M3 - Article
AN - SCOPUS:84984342528
SN - 0863-1042
VL - 35
SP - 433
EP - 438
JO - Contributions to Plasma Physics
JF - Contributions to Plasma Physics
IS - 4-5
ER -