Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes

M. A. Guillorn; J. H. Whealton; L. R. Baylor; A. V. Melechko; V. I. Merkulov; D. K. Hensley; M. D. Hale; R. J. Kasica; D. H. Lowndes; M. L. Simpson

Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes

M. A. Guillorn, J. H. Whealton, L. R. Baylor, A. V. Melechko, V. I. Merkulov, D. K. Hensley, M. D. Hale, R. J. Kasica, D. H. Lowndes, M. L. Simpson

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

A massively parallel electron beam array suitable for performing high throughput direct write electron beam lithography is being developed at the Oak Ridge National Laboratory. This application requires the design and construction of robust field emission electron sources that can be electrostatically focused by a microfabricated structure and integrated with prefabricated control electronics on a monolithic substrate. Due to moderate threshold field for the emission of electrons and environmental stability, the vertically aligned carbon nanofiber (VACNF) constitutes an ideal cathode material for this purpose. A model of electron emission from the VACNF was constructed from operational results obtained from integrated electron sources using single VACNF cathodes. This model was used to design a microcolumn capable of generating an electron beam with a kinetic energy of 1.2 keV and a diameter of 50 nm at a working distance of 100 μm.

Original language	English
Title of host publication	2003 Nanotechnology Conference and Trade Show - Nanotech 2003
Editors	M. Laudon, B. Romanowicz
Pages	346-349
Number of pages	4
State	Published - 2003
Event	2003 Nanotechnology Conference and Trade Show - Nanotech 2003 - San Francisco, CA, United States Duration: Feb 23 2003 → Feb 27 2003

Publication series

Name	2003 Nanotechnology Conference and Trade Show - Nanotech 2003
Volume	3

Conference

Conference	2003 Nanotechnology Conference and Trade Show - Nanotech 2003
Country/Territory	United States
City	San Francisco, CA
Period	02/23/03 → 02/27/03

Keywords

Carbon nanofiber
Field emission
Microcolumn
Next generation lithography
Vacuum microelectronics

Cite this

Guillorn, M. A., Whealton, J. H., Baylor, L. R., Melechko, A. V., Merkulov, V. I., Hensley, D. K., Hale, M. D., Kasica, R. J., Lowndes, D. H., & Simpson, M. L. (2003). Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes. In M. Laudon, & B. Romanowicz (Eds.), 2003 Nanotechnology Conference and Trade Show - Nanotech 2003 (pp. 346-349). (2003 Nanotechnology Conference and Trade Show - Nanotech 2003; Vol. 3).

Guillorn, M. A. ; Whealton, J. H. ; Baylor, L. R. et al. / Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes. 2003 Nanotechnology Conference and Trade Show - Nanotech 2003. editor / M. Laudon ; B. Romanowicz. 2003. pp. 346-349 (2003 Nanotechnology Conference and Trade Show - Nanotech 2003).

@inproceedings{eb7d45652f7d4d65bd99d24126b8b991,

title = "Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes",

abstract = "A massively parallel electron beam array suitable for performing high throughput direct write electron beam lithography is being developed at the Oak Ridge National Laboratory. This application requires the design and construction of robust field emission electron sources that can be electrostatically focused by a microfabricated structure and integrated with prefabricated control electronics on a monolithic substrate. Due to moderate threshold field for the emission of electrons and environmental stability, the vertically aligned carbon nanofiber (VACNF) constitutes an ideal cathode material for this purpose. A model of electron emission from the VACNF was constructed from operational results obtained from integrated electron sources using single VACNF cathodes. This model was used to design a microcolumn capable of generating an electron beam with a kinetic energy of 1.2 keV and a diameter of 50 nm at a working distance of 100 μm.",

keywords = "Carbon nanofiber, Field emission, Microcolumn, Next generation lithography, Vacuum microelectronics",

author = "Guillorn, {M. A.} and Whealton, {J. H.} and Baylor, {L. R.} and Melechko, {A. V.} and Merkulov, {V. I.} and Hensley, {D. K.} and Hale, {M. D.} and Kasica, {R. J.} and Lowndes, {D. H.} and Simpson, {M. L.}",

year = "2003",

language = "English",

isbn = "0972842209",

series = "2003 Nanotechnology Conference and Trade Show - Nanotech 2003",

pages = "346--349",

editor = "M. Laudon and B. Romanowicz",

booktitle = "2003 Nanotechnology Conference and Trade Show - Nanotech 2003",

note = "2003 Nanotechnology Conference and Trade Show - Nanotech 2003 ; Conference date: 23-02-2003 Through 27-02-2003",

}

Guillorn, MA, Whealton, JH, Baylor, LR, Melechko, AV, Merkulov, VI, Hensley, DK, Hale, MD, Kasica, RJ, Lowndes, DH & Simpson, ML 2003, Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes. in M Laudon & B Romanowicz (eds), 2003 Nanotechnology Conference and Trade Show - Nanotech 2003. 2003 Nanotechnology Conference and Trade Show - Nanotech 2003, vol. 3, pp. 346-349, 2003 Nanotechnology Conference and Trade Show - Nanotech 2003, San Francisco, CA, United States, 02/23/03.

Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes. / Guillorn, M. A.; Whealton, J. H.; Baylor, L. R. et al.
2003 Nanotechnology Conference and Trade Show - Nanotech 2003. ed. / M. Laudon; B. Romanowicz. 2003. p. 346-349 (2003 Nanotechnology Conference and Trade Show - Nanotech 2003; Vol. 3).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes

AU - Guillorn, M. A.

AU - Whealton, J. H.

AU - Baylor, L. R.

AU - Melechko, A. V.

AU - Merkulov, V. I.

AU - Hensley, D. K.

AU - Hale, M. D.

AU - Kasica, R. J.

AU - Lowndes, D. H.

AU - Simpson, M. L.

PY - 2003

Y1 - 2003

N2 - A massively parallel electron beam array suitable for performing high throughput direct write electron beam lithography is being developed at the Oak Ridge National Laboratory. This application requires the design and construction of robust field emission electron sources that can be electrostatically focused by a microfabricated structure and integrated with prefabricated control electronics on a monolithic substrate. Due to moderate threshold field for the emission of electrons and environmental stability, the vertically aligned carbon nanofiber (VACNF) constitutes an ideal cathode material for this purpose. A model of electron emission from the VACNF was constructed from operational results obtained from integrated electron sources using single VACNF cathodes. This model was used to design a microcolumn capable of generating an electron beam with a kinetic energy of 1.2 keV and a diameter of 50 nm at a working distance of 100 μm.

AB - A massively parallel electron beam array suitable for performing high throughput direct write electron beam lithography is being developed at the Oak Ridge National Laboratory. This application requires the design and construction of robust field emission electron sources that can be electrostatically focused by a microfabricated structure and integrated with prefabricated control electronics on a monolithic substrate. Due to moderate threshold field for the emission of electrons and environmental stability, the vertically aligned carbon nanofiber (VACNF) constitutes an ideal cathode material for this purpose. A model of electron emission from the VACNF was constructed from operational results obtained from integrated electron sources using single VACNF cathodes. This model was used to design a microcolumn capable of generating an electron beam with a kinetic energy of 1.2 keV and a diameter of 50 nm at a working distance of 100 μm.

KW - Carbon nanofiber

KW - Field emission

KW - Microcolumn

KW - Next generation lithography

KW - Vacuum microelectronics

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M3 - Conference contribution

AN - SCOPUS:6344243457

SN - 0972842209

SN - 9780972842204

T3 - 2003 Nanotechnology Conference and Trade Show - Nanotech 2003

SP - 346

EP - 349

BT - 2003 Nanotechnology Conference and Trade Show - Nanotech 2003

A2 - Laudon, M.

A2 - Romanowicz, B.

T2 - 2003 Nanotechnology Conference and Trade Show - Nanotech 2003

Y2 - 23 February 2003 through 27 February 2003

ER -

Guillorn MA, Whealton JH, Baylor LR, Melechko AV, Merkulov VI, Hensley DK et al. Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes. In Laudon M, Romanowicz B, editors, 2003 Nanotechnology Conference and Trade Show - Nanotech 2003. 2003. p. 346-349. (2003 Nanotechnology Conference and Trade Show - Nanotech 2003).

Electron source design for a massively parallel electron beam lithography system using single vertically aligned carbon nanofiber cathodes

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Keywords

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