Abstract
Electron-beam (e-beam) manipulation of single dopant atoms in an aberration-corrected scanning transmission electron microscope is emerging as a method for directed atomic motion and atom-by-atom assembly. Until now, the dopant species have been limited to atoms closely matched to carbon in terms of ionic radius and capable of strong covalent bonding with carbon atoms in the graphene lattice. In situ dopant insertion into a graphene lattice has thus far been demonstrated only for Si, which is ubiquitously present as a contaminant in this material. Here, we achieve in situ manipulation of Pt atoms and their insertion into the graphene host matrix using the e-beam deposited Pt on graphene as a host system. We further demonstrate a mechanism for stabilization of the Pt atom, enabled through the formation of Si-stabilized Pt heteroatomic clusters attached to the graphene surface. This study provides evidence toward the universality of the e-beam assembly approach, opening a pathway for exploring cluster chemistry through direct assembly.
Original language | English |
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Pages (from-to) | 750-757 |
Number of pages | 8 |
Journal | Carbon |
Volume | 161 |
DOIs | |
State | Published - May 2020 |
Funding
This work was supported by the U.S. Department of Energy , Office of Science , Basic Energy Sciences , Materials Science and Engineering Division (O.D., A.L., S.V.K, B.S., S.J.) and was performed at the Oak Ridge National Laboratory’s Center for Nanophase Materials Sciences (CNMS), a U.S. Department of Energy, Office of Science User Facility. P.D.R. and J.D.F. acknowledge support for the electron beam induced deposition was provided by the Nanofabrication Research Laboratory at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility. CZ acknowledges support from the US Department of Energy (DOE) under Grant No. DOE DE-SC0002136 . This work was supported by the U.S. Department of Energy, Office of Science, Basic Energy Sciences, Materials Science and Engineering Division (O.D. A.L. S.V.K, B.S. S.J.) and was performed at the Oak Ridge National Laboratory's Center for Nanophase Materials Sciences (CNMS), a U.S. Department of Energy, Office of Science User Facility. P.D.R. and J.D.F. acknowledge support for the electron beam induced deposition was provided by the Nanofabrication Research Laboratory at the Center for Nanophase Materials Sciences, which is a DOE Office of Science User Facility. CZ acknowledges support from the US Department of Energy (DOE) under Grant No. DOE DE-SC0002136.
Funders | Funder number |
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Center for Nanophase Materials Sciences | |
Oak Ridge National Laboratory | |
Oak Ridge National Laboratory | |
U.S. Department of Energy | DOE DE-SC0002136 |
Office of Science | |
Basic Energy Sciences | |
Division of Materials Sciences and Engineering |
Keywords
- Atomic manipulation
- Dopant cluster assembly
- Dopant insertion
- Graphene
- Scanning transmission electron microscopy