Electrified vapour deposition at ultrahigh temperature and atmospheric pressure for nanomaterials synthesis

Xizheng Wang, Ning Liu, Zhennan Huang, Ji Yang, Gang Chen, Boyang Li, Ti Xie, Sean Overa, Alexandra H. Brozena, Tangyuan Li, Farhan Mumtaz, Bohong Zhang, Ying Lin, Mingze Li, Bowen Mei, Shuke Li, Jinsong Huang, Jie Huang, Feng Jiao, Cheng GongGuofeng Wang, Miaofang Chi, Ichiro Takeuchi, Yiguang Ju, Liangbing Hu

Research output: Contribution to journalArticlepeer-review

Abstract

Vapour-phase synthesis methods have shown promise for the scalable synthesis of nanomaterials and coatings. However, the vaporization of different precursors for the synthesis of a broad nanomaterial space, particularly at atmospheric pressure, while maintaining compositional and structural control of the final product is challenging. Here we report the generation of an ultrahigh-temperature atomic vapour at atmospheric pressure based on electrified heating, for the growth of multi-elemental nanomaterials and thin films. This process relies on a reactor design whereby solid-state precursors are vaporized within a semi-confined space beneath an electrified heater that can reach ~3,000 K. The proximity of the heater rapidly breaks down the bonds of metal salt precursors and decomposes them into an atomic vapour that expands into a high-temperature (>2,000 K), highly reactive and high-flux vapour (1021–1022 atoms per cm2 per second) that travels upwards in a directional flow. When mixed with entrained ambient gases, the highly reactive atomic species rapidly nucleate and grow into the desired final products, including alloys, oxides, sulfides and thin films, which can be deposited on a low-temperature substrate. This EVD approach can synthesize a broad range of functional nanomaterials at atmospheric pressure, including single-phase multi-elemental nanomaterials formed under thermodynamically non-equilibrium conditions. (Figure presented.)

Original languageEnglish
JournalNature Synthesis
DOIs
StateAccepted/In press - 2025

Funding

We acknowledge support from the A. James & Alice B. Clark Foundation and A. James Clark School of Engineering at the University of Maryland. We also acknowledge the use and support of the Maryland NanoCenter and its AIM Lab. X.W. acknowledges the support from the US Department of Energy (DOE), Advanced Research Projects Agency–Energy (ARPA-E) for studies on thin-film deposition mechanisms via EVD under Award DE-AR0001922. Y.J. acknowledges support from the US DOE grants of DE-SC0025371 and SC0021135 and NSF grant OIA-2428523. G.W. acknowledges financial support from the National Science Foundation (grant DMR 1905572) and computational resources provided by the University of Pittsburgh Center for Research Computing. M.C. was supported by the US DOE, Office of Science, Office of Basic Energy Sciences (BES), Division of Materials Science and Engineering. Microscopy was performed at the Center for Nanophase Materials Sciences, which is a US DOE, Office of Science User Facility at Oak Ridge National Laboratory. F.J. acknowledges support from the National Science Foundation (award EEC-2330245). Z.H. acknowledges support from the US DOE, Office of Science, Office of Basic Energy Sciences, Chemical Sciences, Geosciences, and Biosciences Division Catalysis Science Program. Jinsong Huang acknowledges the support from the US DOE, BES, Division of Materials Sciences and Engineering under award DE-SC0025281.

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