Abstract
The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid-delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode were prepared onto SiO2 and polySi substrate structures using ion beam sputtering technique. Since the preparation conditions of the top electrode influence on the electrical properties of dielectric films, process conditions for Pt top electrode were optimized before the electrical measurement. It is observed that the annealing of top electrode improve the leakage current of BST films and the electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Ir and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films.
Original language | English |
---|---|
Pages (from-to) | S1652-S1656 |
Journal | Journal of the Korean Physical Society |
Volume | 32 |
Issue number | 4 SUPPL. |
State | Published - 1998 |
Externally published | Yes |