Elasticity and adhesion of thin films by a mechanical resonance method

F. A. List, R. A. McKee

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We describe a simple experimental apparatus capable of simultaneous measurements of elastic and anelastic properties of film/substrate composites in controlled atmospheres (10-6-104 Pa) from 25 to 1000°C. The apparatus employs the technique of dynamic resonance in which the mechanical response of a material can be determined over a wide range of frequency (0.1-100 kHz) with a resolution of ±1 μHz. We present experimental results for thin films (approximately 100 nm) of nickel and gold on sapphire substrates. These results demonstrate the sensitivity of the apparatus to both the adhesion and the elasticity of the supported film.

Original languageEnglish
Pages (from-to)17-25
Number of pages9
JournalThin Solid Films
Volume151
Issue number1
DOIs
StatePublished - Jul 20 1987

Funding

This research was supported in part (F.A.L.) by an appointment to the U.S. Department of Energy Postgraduate Research Training program administered by Oak Ridge Associated Universities.

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