Elastic and inelastic scattering in silicon using Mössbauer diffraction

M. L. Crow; G. Schupp; W. B. Yelon; J. G. Mullen; A. Djedid

doi:10.1007/BF02399523

Elastic and inelastic scattering in silicon using Mössbauer diffraction

M. L. Crow, G. Schupp, W. B. Yelon, J. G. Mullen, A. Djedid

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Abstract

The Mossbauer diffraction instrument at the Missouri University Research Reactor has been used to measure the elastic and inelastic contributions to the 444 Bragg reflection in dynamic silicon at room temperature. These measurements used the 46.5-keV gamma rays from high intensity¹⁸³Ta sources cooled to liquid nitrogen temperature. The main feature of this study compared to similar measurements on silicon is the significantly improved momentum space resolution. ΔQ values of 0.011 Å^-1 and 0.11 Å^-1 were measured for the transverse and longitudinal directions, respectively.

Original language	English
Pages (from-to)	1517-1520
Number of pages	4
Journal	Hyperfine Interactions
Volume	29
Issue number	1-4
DOIs	https://doi.org/10.1007/BF02399523
State	Published - Feb 1986
Externally published	Yes

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title = "Elastic and inelastic scattering in silicon using M{\"o}ssbauer diffraction",

abstract = "The Mossbauer diffraction instrument at the Missouri University Research Reactor has been used to measure the elastic and inelastic contributions to the 444 Bragg reflection in dynamic silicon at room temperature. These measurements used the 46.5-keV gamma rays from high intensity183Ta sources cooled to liquid nitrogen temperature. The main feature of this study compared to similar measurements on silicon is the significantly improved momentum space resolution. ΔQ values of 0.011 {\AA}-1 and 0.11 {\AA}-1 were measured for the transverse and longitudinal directions, respectively.",

author = "Crow, {M. L.} and G. Schupp and Yelon, {W. B.} and Mullen, {J. G.} and A. Djedid",

year = "1986",

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doi = "10.1007/BF02399523",

language = "English",

volume = "29",

pages = "1517--1520",

journal = "Hyperfine Interactions",

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AU - Crow, M. L.

AU - Schupp, G.

AU - Yelon, W. B.

AU - Mullen, J. G.

AU - Djedid, A.

PY - 1986/2

Y1 - 1986/2

N2 - The Mossbauer diffraction instrument at the Missouri University Research Reactor has been used to measure the elastic and inelastic contributions to the 444 Bragg reflection in dynamic silicon at room temperature. These measurements used the 46.5-keV gamma rays from high intensity183Ta sources cooled to liquid nitrogen temperature. The main feature of this study compared to similar measurements on silicon is the significantly improved momentum space resolution. ΔQ values of 0.011 Å-1 and 0.11 Å-1 were measured for the transverse and longitudinal directions, respectively.

AB - The Mossbauer diffraction instrument at the Missouri University Research Reactor has been used to measure the elastic and inelastic contributions to the 444 Bragg reflection in dynamic silicon at room temperature. These measurements used the 46.5-keV gamma rays from high intensity183Ta sources cooled to liquid nitrogen temperature. The main feature of this study compared to similar measurements on silicon is the significantly improved momentum space resolution. ΔQ values of 0.011 Å-1 and 0.11 Å-1 were measured for the transverse and longitudinal directions, respectively.

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DO - 10.1007/BF02399523

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ER -

Elastic and inelastic scattering in silicon using Mössbauer diffraction

Abstract

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