Effusive flow delay times for gaseous species in a compact rf ion source a

R. F. Welton, A. Piotrowski, G. D. Alton, S. N. Murray

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

A rf ion source is presently being developed and evaluated as a potential candidate for use in generating radioactive ion beams (RIBs) for the experimental research program at the Holifield Radioactive Ion Beam Facility (HRIBF) now under construction at the Oak Ridge National Laboratory. For this application, any time delays that are excessively long with respect to the half-life of the radioactive species of interest can result in significant losses of the RIB intensity; therefore the times for effusive flow through the ion source are of fundamental importance since they set limits on the minimum half-life of radioactive species that can be processed in the source. Complementary experimental and computational techniques have been developed which can be used to determine the characteristic delay times for gaseous species in low-pressure ion source assemblies. These techniques are used to characterize the effusive delay times for the stable counterparts of various atomic and molecular radioactive species in the ORNL-rf source: He, Ne, Ar, Kr, Xe, H2, CO, CO2, N2, N2O, and O2.

Original languageEnglish
Pages (from-to)1670-1673
Number of pages4
JournalReview of Scientific Instruments
Volume67
Issue number4
DOIs
StatePublished - Apr 1996

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