Effects of oxygen partial pressure on the electrical and optical properties of pulsed-laser-deposited sb-doped Sno2films

Hyun Gi Hong, June O. Song, Sang Ho Kim, Takhee Lee, Tae Yeon Seong

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11 Scopus citations

Abstract

We have investigated the electrical and optical properties of pulsed-laser-deposited Sb-doped SnO2films (250 nm thick) as a function of the oxygen partial pressure. The SnO2films were grown on glass substrates using a SnO2target containing 5 atom % Sb. The distance between the substrate and the target was 7 cm and working pressure varied from 1.1 to 13.3 Pa. The target was ablated using KrF excimer laser with energy density of 3.75 J/cm2. It is shown that the electrical and optical properties of the films grown at 480°C with 3000 pulses sensitively depend on the oxygen pressure. The electron concentration is maximum (5.6 × 1020cm-3) at 4 Pa, the electron mobility is maximum (8.5 cm2V-1s-1) at 9.3 Pa, and the resistivity is minimum (2.5 × 10-3Ω cm) at 4 Pa. The transmittance is shown to depend on the oxygen pressures. X-ray diffraction results show that the crystalline quality of the films becomes improved with decreasing oxygen pressure. It is further shown that the sample grown at 1.1 Pa contains oxygen-deficient phases. The UV absorption edge of the films shifts toward the shorter wavelengths with decreasing oxygen pressure, which is attributed to Burstein-Moss shift.

Original languageEnglish
Pages (from-to)G922-G925
JournalJournal of the Electrochemical Society
Volume153
Issue number10
DOIs
StatePublished - Jan 1 2006
Externally publishedYes

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