Effects of MeV energy titanium ion implants on the oxygen related defects centers in silica

R. H. Magruder, R. A. Weller, R. A. Weeks, R. A. Zuhr, D. K. Hensley

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Silica samples were implanted with 4 MeV Ti2+ ions at nominal doses ranging from 0.1 to 5.0×1015 cm-2. Optical absorption was measured from 3.5 to 6.5 eV and in all spectra a local maximum at 5.0 eV and a shoulder at 5.9 eV were observed. A second series of samples was implanted with 4 MeV Si2+ ions at nominal doses ranging from 0.5 to 3.0×1015 cm-2. Based on the literature we assumed that Gaussian bands at 4.8, 5.01, 5.17, 5.88, and 7.15 eV comprised the observed spectra. Using Gaussian functions as basis states, linear fits to the data were performed yielding amplitudes for each band. Between 3.5 and 5.5 eV the fits were within ±3%. At larger energies the fits were unsatisfactory. Non-linear fits with an additional, fully adjustable Gaussian function yielded a band at 6.4 eV with full width at half maximum approximately 0.5 eV and reduced the difference between the fit and the data to <2% over the full range of the measurements.

Original languageEnglish
Pages (from-to)282-288
Number of pages7
JournalJournal of Non-Crystalline Solids
Volume274
Issue number1
DOIs
StatePublished - Sep 2000

Funding

The authors acknowledge the support of Oak Ridge National Laboratory, managed by Lockheed Martin Energy Research Corporation for the US Department of Energy under contract number DE-AC05-96OR22464.

FundersFunder number
US Department of EnergyDE-AC05-96OR22464
Lockheed Martin Corporation
Oak Ridge National Laboratory

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