Effects of Kr, N2, and Ar on address discharge time lag in AC plasma-display panel with high xenon content

Kyung Cheol Choi, Sang Ho Kim, Bhum Jae Shin, Jungwon Kang, Kwang Yeol Choi, Eun Ho Yoo

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

The additive gas effect on the discharge time lag of the address pulse was investigated in an ac plasma-display panel (PDP) with a Ne + 13% Xe gas mixture. A small amount of Kr, N2, and Ar gas, respectively, was added to a Ne + 13% Xe gas mixture to improve the address discharge time lag of an ac PDP. It was found that the address discharge time lag was improved by adding a small amount of Kr gas (up to 2%) to the Ne + 13% Xe gas mixture and thereafter worsened. In the case of the addition of Ar gas to Ne + 13% Xe, the discharge time lag of the address pulse was not improved. The concentration of N 2 in the Ne + 13% Xe gas mixture was varied from 0.013% to 0.187%, and its effects on the address discharge time lag were investigated. The time lag for the address discharge with a Ne + 13% Xe + 0.013% N2 gas mixture was improved.

Original languageEnglish
Pages (from-to)2410-2413
Number of pages4
JournalIEEE Transactions on Electron Devices
Volume53
Issue number9
DOIs
StatePublished - Sep 2006
Externally publishedYes

Keywords

  • Argon
  • Discharge time lag
  • Krypton
  • Nitrogen
  • Plasma-display panel (PDP)

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