Effects of bottom electrode on the structural and electrical properties of PbTiO3 ferroelectric thin films

Ho Nyung Lee; Yong Tae Kim; Sung Ho Choh

doi:10.1080/00150199708008393

Effects of bottom electrode on the structural and electrical properties of PbTiO₃ ferroelectric thin films

Ho Nyung Lee, Yong Tae Kim, Sung Ho Choh

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4 Scopus citations

Abstract

The effect of RuO_x and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO₃ are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO₃ films on RuO_x and Pt are recrystallized along the 100 direction after annealing at 600°C for 30min in O₂ ambient The leakage current density for both samples are very similar, whereas the dielectric property of RuO_xPbTiO₃ is superior to that of Pt/PbTiO₃ due to the large grain growth of PbTiO₃ on RuO_x confirmed with cross-sectional transmission electron microscopy.

Original language	English
Pages (from-to)	97-103
Number of pages	7
Journal	Ferroelectrics
Volume	197
Issue number	1-4
DOIs	https://doi.org/10.1080/00150199708008393
State	Published - 1997
Externally published	Yes

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abstract = "The effect of RuOx and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO3 are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO3 films on RuOx and Pt are recrystallized along the 100 direction after annealing at 600°C for 30min in O2 ambient The leakage current density for both samples are very similar, whereas the dielectric property of RuOxPbTiO3 is superior to that of Pt/PbTiO3 due to the large grain growth of PbTiO3 on RuOx confirmed with cross-sectional transmission electron microscopy.",

author = "Lee, {Ho Nyung} and Kim, {Yong Tae} and Choh, {Sung Ho}",

year = "1997",

doi = "10.1080/00150199708008393",

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journal = "Ferroelectrics",

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T1 - Effects of bottom electrode on the structural and electrical properties of PbTiO3 ferroelectric thin films

AU - Lee, Ho Nyung

AU - Kim, Yong Tae

AU - Choh, Sung Ho

PY - 1997

Y1 - 1997

N2 - The effect of RuOx and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO3 are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO3 films on RuOx and Pt are recrystallized along the 100 direction after annealing at 600°C for 30min in O2 ambient The leakage current density for both samples are very similar, whereas the dielectric property of RuOxPbTiO3 is superior to that of Pt/PbTiO3 due to the large grain growth of PbTiO3 on RuOx confirmed with cross-sectional transmission electron microscopy.

AB - The effect of RuOx and Pt electrodes on the crystal structure, leakage current characteristics and dielectric properties of PbTiO3 are compared with as-deposited and annealed samples. As a result, amorphous or microcrystalline PbTiO3 films on RuOx and Pt are recrystallized along the 100 direction after annealing at 600°C for 30min in O2 ambient The leakage current density for both samples are very similar, whereas the dielectric property of RuOxPbTiO3 is superior to that of Pt/PbTiO3 due to the large grain growth of PbTiO3 on RuOx confirmed with cross-sectional transmission electron microscopy.

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U2 - 10.1080/00150199708008393

DO - 10.1080/00150199708008393

M3 - Article

AN - SCOPUS:0031353187

SN - 0015-0193

VL - 197

SP - 97

EP - 103

JO - Ferroelectrics

JF - Ferroelectrics

IS - 1-4

ER -

Effects of bottom electrode on the structural and electrical properties of PbTiO₃ ferroelectric thin films

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