Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device

H. Takahashi; M. Osakabe; K. Nagaoka; H. Nakano; M. Tokitani; K. Fujii; S. Murakami; Y. Takeiri; T. Seki; K. Saito; H. Kasahara; R. Seki; S. Kamio; S. Masuzaki; T. Mutoh

doi:10.1016/j.jnucmat.2014.11.131

Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device

H. Takahashi, M. Osakabe, K. Nagaoka, H. Nakano, M. Tokitani, K. Fujii, S. Murakami, Y. Takeiri, T. Seki, K. Saito, H. Kasahara, R. Seki, S. Kamio, S. Masuzaki, T. Mutoh

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

Abstract The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperature T_i were observed. There was no difference in the attained central T_i of the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higher T_i plasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for high T_i plasma production.

Original language	English
Article number	48727
Pages (from-to)	1100-1103
Number of pages	4
Journal	Journal of Nuclear Materials
Volume	463
DOIs	https://doi.org/10.1016/j.jnucmat.2014.11.131
State	Published - Jul 22 2015
Externally published	Yes

Funding

This work was supported by the NIFS grants , ULRR701, 702, and 703.

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Takahashi, H., Osakabe, M., Nagaoka, K., Nakano, H., Tokitani, M., Fujii, K., Murakami, S., Takeiri, Y., Seki, T., Saito, K., Kasahara, H., Seki, R., Kamio, S., Masuzaki, S., & Mutoh, T. (2015). Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device. Journal of Nuclear Materials, 463, 1100-1103. Article 48727. https://doi.org/10.1016/j.jnucmat.2014.11.131

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title = "Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device",

abstract = "Abstract The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperature Ti were observed. There was no difference in the attained central Ti of the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higher Ti plasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for high Ti plasma production.",

author = "H. Takahashi and M. Osakabe and K. Nagaoka and H. Nakano and M. Tokitani and K. Fujii and S. Murakami and Y. Takeiri and T. Seki and K. Saito and H. Kasahara and R. Seki and S. Kamio and S. Masuzaki and T. Mutoh",

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Takahashi, H, Osakabe, M, Nagaoka, K, Nakano, H, Tokitani, M, Fujii, K, Murakami, S, Takeiri, Y, Seki, T, Saito, K, Kasahara, H, Seki, R, Kamio, S, Masuzaki, S & Mutoh, T 2015, 'Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device', Journal of Nuclear Materials, vol. 463, 48727, pp. 1100-1103. https://doi.org/10.1016/j.jnucmat.2014.11.131

TY - JOUR

T1 - Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device

AU - Takahashi, H.

AU - Osakabe, M.

AU - Nagaoka, K.

AU - Nakano, H.

AU - Tokitani, M.

AU - Fujii, K.

AU - Murakami, S.

AU - Takeiri, Y.

AU - Seki, T.

AU - Saito, K.

AU - Kasahara, H.

AU - Seki, R.

AU - Kamio, S.

AU - Masuzaki, S.

AU - Mutoh, T.

PY - 2015/7/22

Y1 - 2015/7/22

N2 - Abstract The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperature Ti were observed. There was no difference in the attained central Ti of the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higher Ti plasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for high Ti plasma production.

AB - Abstract The wall conditioning using radio frequency (RF) plasma was carried out using Ion Cyclotron Range of Frequency (ICRF) heating and/or Electron Cyclotron Resonance Heating (ECRH) with the working gas of helium under the established confinement magnetic field. After sufficient numbers of repetitive wall discharge conditioning (DC, ICDC for ICRF and ECDC for ECRH), the formation of the parabolic electron density profile and the increase of the central ion temperature Ti were observed. There was no difference in the attained central Ti of the NBI discharge just after the conditioning using a similar value of input energy regardless of the applied RF source. Thus, it is concluded that both ICDC and the ECDC are effective for the higher Ti plasma production under the established magnetic field in the Large Helical Device. The effective RF wall conditioning scenarios are also investigated for high Ti plasma production.

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SP - 1100

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JO - Journal of Nuclear Materials

JF - Journal of Nuclear Materials

M1 - 48727

ER -

Effect of the RF wall conditioning on the high performance plasmas in the Large Helical Device

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