Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFe O3 films

Dae Ho Kim; Ho Nyung Lee; Michael D. Biegalski; Hans M. Christen

doi:10.1063/1.2830799

Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFe O3 films

Dae Ho Kim, Ho Nyung Lee, Michael D. Biegalski, Hans M. Christen

Materials Science and Technology Div

Research output: Contribution to journal › Article › peer-review

148 Scopus citations

Abstract

Multiferroic BiFe O3 epitaxial films with thicknesses ranging from 40 to 960 nm were grown by pulsed laser deposition on SrTi O3 (001) substrates with SrRu O3 bottom electrodes. X-ray characterization shows that the structure evolves from angularly distorted tetragonal with ca≈1.04 to more bulklike distorted rhombohedral (ca≈1.01) as the strain relaxes with increasing thickness. Despite this significant structural evolution, the ferroelectric polarization along the body diagonal of the distorted pseudocubic unit cells, as calculated from measurements along the normal direction, barely changes.

Original language	English
Article number	012911
Journal	Applied Physics Letters
Volume	92
Issue number	1
DOIs	https://doi.org/10.1063/1.2830799
State	Published - 2008

Funding

The authors thank P. H. Fleming for technical assistance. Research sponsored by the Division of Materials Sciences and Engineering (DHK, HNL, HMC) and the Division of Scientific User Facilities (MDB), Basic Energy Sciences, U.S. Department of Energy.

Funders	Funder number
MDB
U.S. Department of Energy
Basic Energy Sciences
Division of Materials Sciences and Engineering

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@article{0b4e9e593cc047a292b5965c8b257460,

title = "Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFe O3 films",

abstract = "Multiferroic BiFe O3 epitaxial films with thicknesses ranging from 40 to 960 nm were grown by pulsed laser deposition on SrTi O3 (001) substrates with SrRu O3 bottom electrodes. X-ray characterization shows that the structure evolves from angularly distorted tetragonal with ca≈1.04 to more bulklike distorted rhombohedral (ca≈1.01) as the strain relaxes with increasing thickness. Despite this significant structural evolution, the ferroelectric polarization along the body diagonal of the distorted pseudocubic unit cells, as calculated from measurements along the normal direction, barely changes.",

author = "Kim, {Dae Ho} and Lee, {Ho Nyung} and Biegalski, {Michael D.} and Christen, {Hans M.}",

year = "2008",

doi = "10.1063/1.2830799",

language = "English",

volume = "92",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFe O3 films

AU - Kim, Dae Ho

AU - Lee, Ho Nyung

AU - Biegalski, Michael D.

AU - Christen, Hans M.

PY - 2008

Y1 - 2008

N2 - Multiferroic BiFe O3 epitaxial films with thicknesses ranging from 40 to 960 nm were grown by pulsed laser deposition on SrTi O3 (001) substrates with SrRu O3 bottom electrodes. X-ray characterization shows that the structure evolves from angularly distorted tetragonal with ca≈1.04 to more bulklike distorted rhombohedral (ca≈1.01) as the strain relaxes with increasing thickness. Despite this significant structural evolution, the ferroelectric polarization along the body diagonal of the distorted pseudocubic unit cells, as calculated from measurements along the normal direction, barely changes.

AB - Multiferroic BiFe O3 epitaxial films with thicknesses ranging from 40 to 960 nm were grown by pulsed laser deposition on SrTi O3 (001) substrates with SrRu O3 bottom electrodes. X-ray characterization shows that the structure evolves from angularly distorted tetragonal with ca≈1.04 to more bulklike distorted rhombohedral (ca≈1.01) as the strain relaxes with increasing thickness. Despite this significant structural evolution, the ferroelectric polarization along the body diagonal of the distorted pseudocubic unit cells, as calculated from measurements along the normal direction, barely changes.

UR - http://www.scopus.com/inward/record.url?scp=38049074733&partnerID=8YFLogxK

U2 - 10.1063/1.2830799

DO - 10.1063/1.2830799

M3 - Article

AN - SCOPUS:38049074733

SN - 0003-6951

VL - 92

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

M1 - 012911

ER -

Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFe O3 films

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