Doping characterization of InAsGaAs quantum dot heterostructure by cross-sectional scanning capacitance microscopy

Z. Y. Zhao, W. M. Zhang, C. Yi, A. D. Stiff-Roberts, B. J. Rodriguez, A. P. Baddorf

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Abstract

In order to better understand dopant incorporation in quantum dot infrared photodetectors, the application of cross-sectional scanning capacitance microscopy (SCM) has been used to investigate carrier occupation/distribution in a multilayer InAsGaAs quantum dot (QD) heterostructure for different doping techniques. The doping schemes in the QD structure include direct doping (in InAs QD layers) and remote doping (in GaAs barrier layers), each with different doping concentrations. The SCM image suggests that large band bending occurs due to highly doped, remote-doping layers, thereby causing electron redistribution in direct-doping layers. The experimental result is supported by a band structure calculation using the Schrödinger-Poisson method by NEXTNANO3.

Original languageEnglish
Article number092101
JournalApplied Physics Letters
Volume92
Issue number9
DOIs
StatePublished - 2008

Funding

The authors would like to thank the NEXTNANO3 development team at the Walter Schottky Institute for providing the simulation package and some technical support. A portion of this research was conducted at the Center for Nanophase Materials Sciences, which is sponsored at Oak Ridge National Laboratory by the Division of Scientific User Facilities, U.S. Department of Energy. This work is supported, in part, by the Air Force Office of Scientific Research under Grant No. FA9550-06-1-0482 and the National Science Foundation under Grant No. 0547273.

FundersFunder number
Division of Scientific User Facilities
National Science Foundation0547273
U.S. Department of Energy
Air Force Office of Scientific ResearchFA9550-06-1-0482
Oak Ridge National Laboratory

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